{"id":3075,"date":"2021-11-24T10:19:40","date_gmt":"2021-11-24T09:19:40","guid":{"rendered":"https:\/\/lmanew.e6318.servidornet.com\/dual-beam\/"},"modified":"2025-01-17T15:16:01","modified_gmt":"2025-01-17T13:16:01","slug":"dual-beam","status":"publish","type":"page","link":"https:\/\/lma.unizar.es\/en\/dual-beam\/","title":{"rendered":"Dual Beam"},"content":{"rendered":"

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DUAL BEAM<\/h1>\n

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\nMicrofabrication: Dual Beam and Microchatacterization, SEM, XPS, and CRD areas[\/et_pb_text][et_pb_button button_url=”https:\/\/lma.unizar.es\/en\/microfabrication-dual-beam-and-microchatacterization-sem-xps-and-crd-areas\/” button_text=”SEE EQUIPMENT” button_alignment=”center” _builder_version=”4.14.2″ _module_preset=”default” custom_button=”on” button_text_size=”16px” button_bg_color=”#FFFFFF” button_border_width=”0px” button_border_radius=”4px” button_letter_spacing=”0px” button_font=”|700||on|||||” button_icon=”=||divi||400″ custom_margin=”0px||8px||false|false” custom_padding=”4px||4px||true|false” hover_enabled=”0″ button_text_color_tablet=”” button_text_color_phone=”” button_text_color_last_edited=”on|desktop” global_colors_info=”{}” button_bg_color__hover=”#4370b4″ button_bg_color__hover_enabled=”on|hover” button_text_color__hover=”#FFFFFF” button_text_color__hover_enabled=”on|hover” button_border_color__hover=”#4370b4″ button_border_color__hover_enabled=”on|desktop” sticky_enabled=”0″][\/et_pb_button][\/et_pb_column][\/et_pb_row][\/et_pb_section][et_pb_section fb_built=”1″ _builder_version=”4.9.4″ _module_preset=”default” custom_padding=”25px||40px|||” global_colors_info=”{}”][et_pb_row column_structure=”3_5,2_5″ _builder_version=”4.9.4″ _module_preset=”default” max_width=”75%” custom_padding=”||8px|||” global_colors_info=”{}”][et_pb_column type=”3_5″ _builder_version=”4.9.4″ _module_preset=”default” global_colors_info=”{}”][et_pb_text _builder_version=”4.9.4″ _module_preset=”default” text_font_size=”16px” text_line_height=”2em” global_colors_info=”{}”]<\/p>\n

The focused electron and ion beam lithography is a mature technology, used in industry and at laboratory level since the last 20 years. This technology plays nowadays a major role in the context of Nanotechnology. The underlying technology supporting focused electron and ion based equipments relies on the use of field-emission electron and ion sources, the electron and ion acceleration up to tens of kV and their focusing and scanning on the area of interest.<\/p>\n

Currently, electron beams focused to 1 nm and ion beams focused to 5 nm integrate the state-of-the-art electron and ion columns devoted to nanolithography. Together with dedicated electron or ion beam equipments, another option is to combine both types of columns in a single instrument, which is coined dual beam or cross beam, depending on the supplier.<\/p>\n

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Those equipments have normally additional parts such as gas injectors, nanomanipulators, etc., which constitute a nanolaboratory with many applications in Nanotechnology. In particular, the preparation of thin lamellae for subsequent analysis in a Transmission Electron Microscopy (TEM) has become a routine task, with large impact at the Semiconductor industry as well as at the laboratory level. By using cryo-transfer set-ups, it is possible to study frozen samples, which is extremely useful in certain applications.<\/p>\n

On the other hand, the use of environmental SEM is of great interest in life sciences as charging effects are minimized and biological samples can be studied in the right conditions of humidity without degradation.<\/p>\n

The LMA is a unique opportunity for the development of this field.
Several researchers from the local research institutes (INMA, I3A, IUCA, ICB, etc.) develop research lines using the described dual beam and environmental SEM equipments. The SEM, XRD and XPS-AES equipments serve as additional support to these investigations. Hereafter, a brief summary of those research lines are included:<\/p>\n

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In the dual beam equipments for lamellae preparation and nanolithography:<\/span><\/strong><\/p>\n