{"id":3375,"date":"2021-11-25T09:23:20","date_gmt":"2021-11-25T08:23:20","guid":{"rendered":"https:\/\/lmanew.e6318.servidornet.com\/dual-beam-helios-nanolab-600-and-650\/"},"modified":"2025-11-27T15:03:47","modified_gmt":"2025-11-27T13:03:47","slug":"dual-beam-helios-nanolab-600-and-650","status":"publish","type":"post","link":"https:\/\/lma.unizar.es\/en\/dual-beam-helios-nanolab-600-and-650\/","title":{"rendered":"Dual Beam Helios Nanolab 600 and 650"},"content":{"rendered":"

[et_pb_section fb_built=”1″ _builder_version=”4.9.4″ _module_preset=”default” background_color=”#e4e4e4″ positioning=”none” custom_padding=”5px||6px|||” sticky_position=”top” border_width_bottom=”2px” border_color_bottom=”#f4f4f4″ box_shadow_style=”preset3″ saved_tabs=”all” global_colors_info=”{}”][et_pb_row column_structure=”1_2,1_2″ use_custom_gutter=”on” gutter_width=”1″ make_equal=”on” _builder_version=”4.9.4″ _module_preset=”default” max_width=”80%” custom_padding=”1px||3px|||” global_colors_info=”{}”][et_pb_column type=”1_2″ _builder_version=”4.9.4″ _module_preset=”default” background_enable_color=”off” custom_padding=”12px||||false|false” link_option_url=”https:\/\/lmanew.e6318.servidornet.com\/en\/rates\/” border_width_right=”2px” border_color_right=”#FFFFFF” border_width_left=”4px” border_color_left=”#FFFFFF” global_colors_info=”{}”][et_pb_text _builder_version=”4.14.2″ _module_preset=”default” text_font=”|||on|||||” text_text_color=”#FFFFFF” text_font_size=”14px” link_text_color=”#333333″ background_enable_color=”off” custom_padding=”|5px||5px|true|true” border_color_all=”RGBA(0,0,0,0)” border_color_right=”#FFFFFF” border_color_left=”#FFFFFF” global_colors_info=”{}” link_text_color__hover=”#4370b4″ link_text_color__hover_enabled=”on|desktop”]<\/p>\n

OPEN COMPETITIVE ACCESS<\/a><\/strong><\/p>\n

[\/et_pb_text][\/et_pb_column][et_pb_column type=”1_2″ _builder_version=”4.9.4″ _module_preset=”default” background_enable_color=”off” custom_padding=”12px||||false|false” link_option_url=”\/access-protocol\/” border_width_right=”4px” border_color_right=”#FFFFFF” border_width_left=”2px” border_color_left=”#FFFFFF” global_colors_info=”{}”][et_pb_text _builder_version=”4.14.2″ _module_preset=”default” text_font=”|||on|||||” text_text_color=”#FFFFFF” text_font_size=”14px” link_text_color=”#333333″ background_enable_color=”off” custom_padding=”|5px||5px|true|true” border_color_all=”RGBA(0,0,0,0)” border_color_right=”#FFFFFF” border_color_left=”#FFFFFF” global_colors_info=”{}” link_text_color__hover=”#4370b4″ link_text_color__hover_enabled=”on|desktop”]<\/p>\n

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ACCESS ON DEMAND (always available, with fee)<\/a><\/strong><\/p>\n<\/div>\n<\/div>\n<\/div>\n<\/div>\n<\/div>\n

[\/et_pb_text][\/et_pb_column][\/et_pb_row][\/et_pb_section][et_pb_section fb_built=”1″ _builder_version=”4.9.4″ _module_preset=”default” custom_padding=”25px||38px|||” global_colors_info=”{}”][et_pb_row column_structure=”1_2,1_2″ _builder_version=”4.9.4″ _module_preset=”default” max_width=”75%” custom_padding=”||6px|||” global_colors_info=”{}”][et_pb_column type=”1_2″ _builder_version=”4.9.4″ _module_preset=”default” global_colors_info=”{}”][et_pb_text _builder_version=”4.9.4″ _module_preset=”default” text_font_size=”16px” text_line_height=”2em” global_colors_info=”{}”]In INA-LMA’s clean room facilities, there is equipment with different lithography options according to the user’s needs and requirements. This equipment makes it possible to create structures at the micro- and nano-metre scale, following a previously designed pattern and obtaining, at the end of the process, the desired device. In particular, dual beam (FIB-SEM) equipment is mainly used for nanolithography and lamella preparation processes. This equipment is located on two concrete platforms inside the clean room of class 10,000 (ISO7) and 125 m2.<\/p>\n

The Dual Beam Helios 600 model consists of a 30 kV field-emission scanning electron column and a 30 kV Ga focused ion beam placed at 52\u00ba one from each other. The ion column is able to work properly at low voltage (5 kV and lower), allowing the preparation of lamellae with low ion damage. In this equipment, there are five gas injectors which allow the growth of nano-deposits with high resolution, such as W-based superconducting nano-deposits with lateral size of 40 nm and Co-based ferromagnetic nano-deposits with a lateral size of 30 nm. These ultranarrow dimensions are at the forefront of research in these topics. In this equipment, there are five gas injectors which allow the growth of nano-deposits with high resolution, such as W-based superconducting nano-deposits with lateral size of 40 nm and Co-based ferromagnetic nano-deposits with a lateral size of 30 nm. In addition, electrical microprobes (Kleindiek\u00ae) could be placed inside the chamber for in-situ electronic transport measurements; electron beam lithography is also possible thanks to a Raith\u00ae software\/hardware.[\/et_pb_text][et_pb_text disabled_on=”on|on|on” _builder_version=”4.9.4″ _module_preset=”default” text_font=”|700||on|||||” text_text_color=”#FFFFFF” background_color=”#4370b4″ custom_padding=”15px||15px||true|false” link_option_url=”\/wp-content\/uploads\/2021\/09\/Nova_SPA.pdf” border_radii=”on|15px|15px|15px|15px” disabled=”on” global_colors_info=”{}”]<\/p>\n

Download PDF<\/p>\n

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The Dual Beam Helios 650 model is an improved version of the Helios 600 one. Thus, the SEM column has resolution of 0.9 nm and it bears a monochromator and beam deceleration. The FIB column is differentially vacuum-pumped at the lowest part, allowing a well-defined beam profile impacting on the sample surface. Results with such a column indicate that ultranarrow nano-deposits can be grown. This Focused Ion Beam (FIB) column is nicely suited for lamellae preparation too, in combination with the Omniprobe nanomanipulator. The equipment has got 5 gas injectors and electrical microprobes (Kleindiek\u00ae).
Both instruments are working properly for the requested main tasks, i.e., lamellae preparation, cross-section imaging, nanolithography based on ion patterning, ion\/electron nanodeposition, electronic transport measurements and electron beam lithography (Raith\u00ae software\/hardware).<\/p>\n

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Image (resolution 1.4 nm)\/ Analysis:<\/strong>
By using the different detectors available within these instruments, the following information can be obtained:<\/span><\/p>\n