This instrument combines the techniques of atomic force microscopy (AFM) with that of scanning tunneling microscopy (STM) in Ultra-High-Vacuum (UHV) conditions ranging from 300 K to 5K. It is extremely versatile and stable, allowing high-resolution spectroscopy and force measurements. Using a tuning fork probe (q-plus), ultra-thin organic and inorganic systems can be studied on flat surfaces. Additionally, the tip can be functionalized with CO molecules, which provides intra-molecular resolution. As a bonus, the AFM can work on insulating or semiconductor surfaces without current exchange.The equipment has an attached preparation chamber to clean metal substrates and evaporate both organic and inorganic materials, which can be characterized by a low energy electron diffractometer (LEED). It has a chamber for rapid entry of substrates that allows exfoliation.The research lines are oriented to the study of molecular interactions, self-assembled systems, and electronic and structural properties determination of hybrid films composed of metal-organic compounds.  



What can be this equipment used for?

Scanning tunneling microscopy and spectroscopy:

  • Structural and electronic characterization with sub-molecular resolution.
  • Band structure characterization in reciprocal space by means of quasiparticle interference patterns.
  • High-resolution structural characterization using CO functionalized tips.
  • Tip manipulation of atoms and molecules.


Atomic force microscopy:

  • Study of all types of samples: from insulating to metallic.
  • Simultaneous recording of forces and conductance.
  • Map acquisition of electronic charge (surface potential) down to the sub-molecular scale.


Technical specifications

Temperature range: 4.7 K, 78 K and 300 K

LHe / LN2 hold time: 62 /48 hours

Z topographic noise: 3 pm peak-peak; <500 fm/(Hz)^(1/2)

Energy /force resolution: 1 mV / 1 pN

Minimum stable Qplus oscillation: 20-30 pm

In-situ tip exchange.

Quick cooling and stabilization of the piezo

Maximum sample size: 3 mm thick and 10 mm wide.


Sample preparation: Combined resistive heating and LN2 cooling manipulator (temperature range 100 – 1100 K). Low energy electron diffraction equipment (LEED), mass spectrometer (quadrupole) for detection of residual gases, 2 ion guns, 4 leak valves for controlled gas injection, 1 metal evaporator (e-beam) and 2 organic evaporators (resistive heating). Accessory pumping stations. Carrousel with capacity for up to 4 samples.